Science des Procédés Céramiques et de Traitements de Surface (SPCTS)

Partenaires

Centre National de la Recherche Scientifique (CNRS)
Université de Limoges
Ecole Nationale Supérieure de Céramique Industrielle (ENSCI)


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Accueil du site > Axes de recherche > Axe 2 "Procédés de traitements de surface" > Thèmes de recherche > Réactivité > Réactivité en phase gazeuse et dans les couches de surface de matériau dans les procédés de traitement de surface en plasma étendu > Plasma physics and chemistry

Plasma physics and chemistry

Contacts

Jean-Louis JAUBERTEAU jean-louis.jauberteau@unilim.fr
CNRS researcher
Isabelle JAUBERTEAU isabelle.jauberteau@unilim.fr
CNRS researcher
Jacques AUBRETON jacques.aubreton@unilim.fr
CNRS researcher


Context/objectives

The research concerns more particularly the study of reactive plasma processes. It involves the chemical characterization of the gaseous medium and the measurement of the main plasma parameters (energy of electrons, ion and electron density, floating and plasma potential, geometry of the plasma). This work is developed into expanding microwave discharges, working at 2.45 GHz. These investigations interest the scientific community particularly for chemical kinetics data or for the development of plasma characterization techniques adapted to this kind of deposition reactors and conditions. They also have an industrial interest.


Activities

  • Plasma diagnosis and development of adapted analysis techniques
  • Study of produced plasma radical reactivity and measurement of reaction constants


Specific equipments

  • Mass spectrometer
  • Emission and absorption spectroscopy device with a spatial resolution
  • Electrostatic probe device with a spatial resolution (simple and double probes) and specific analysis software for the study of electron energy distribution functions (in the case of simple probes)
  • 2.45GHz microwave reactors


Selected publications

  1. JL. Jauberteau, I. Jauberteau, J. Aubreton
    Absolute electron-impact ionization cross sections of free radicals from threshold to 30 eV : CHx=2,3, Si(CH3)x=1,2,3, and H2Si(CH3) radicals
    Journal of applied Physics, 99, 2006, p 124908-1-10

  2. J.L. Jauberteau, I. Jauberteau
    Plasma parameters deduced from cylindrical probe measurements : determination of the electron density at the ion saturation current
    Plasma Sources Sci. Technol., 17 (2008), 015019-1-11

  3. J.L. Jauberteau, I. Jauberteau
    Determination of the electron density in plasma by means of a floating double probe
    Review of Scientific Instruments, 79, 2008, 033505-1-5

Updated April 2, 2010

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