Science des Procédés Céramiques et de Traitements de Surface (SPCTS)

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Centre National de la Recherche Scientifique (CNRS)
Université de Limoges
Ecole Nationale Supérieure de Céramique Industrielle (ENSCI)


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Accueil du site > Axes de recherche > Axe 2 "Procédés de traitements de surface" > Thèmes de recherche > Réactivité > Réactivité en phase gazeuse et dans les couches de surface de matériau dans les procédés de traitement de surface en plasma étendu > Physical and chemical processes in a nitriding process of thin films

Physical and chemical processes in a nitriding process of thin films

Contacts

Isabelle JAUBERTEAU isabelle.jauberteau@unilim.fr
CNRS researcher
Jean-Louis JAUBERTEAU jean-louis.jauberteau@unilim.fr
CNRS researcher
Jacques AUBRETON jacques.aubreton@unilim.fr
CNRS researcher


Context/objectives

Physical and chemical processes which occur during the contact between active plasma species and a solid surface have a leading role during thin film depositions as well as in thermochemical treatments of materials such as nitriding, carburizing… Treatments take place inside an expanding plasma reactor operating with a microwave discharge of frequency of 2.45GHz. The aim of this work is to highlight reaction and diffusion mechanisms of active species which occur inside surface layers of the material or inside the plasma electrostatic sheath that forms near the surface. The understanding of such mechanisms allows better control and optimization of thin film deposition and surface treatment processes.

 

Nitriding treatment of molybdenum thin films inside an expanding plasma activated by microwave discharge
SIMS diffusion profiles
SIMS diffusion profiles : Before processing (a), in (Ar-25%N2-30%H2) at 300 K (b),
in (Ar-35%N2) at 673 K (c), and in (Ar-25%N2-30%H2) at 673 K (d)
 
AFM measurements
AFM measurements :
Before processing (a), in (Ar-25%N2-30%H2) at 300 K (b),
at 673 K (c) and 873 K (d)


Activities

  • Carburizing and nitriding treatments of metals by plasma.
  • Reaction and diffusion processes which occur on the surface of a material exposed to plasma species or in plasma electrostatic sheath.
  • Correlations between the nature and the energy of impinging plasma species and the processes which occur in the surface layers of the material.


Specific equipments :

  • Expanding plasma reactor operating with a microwave discharge of 2.45GHz.
  • Surface reactivity device including an AES and an ion source.
  • Atomic Force Microscope working in contact mode


Selected publications

  1. I. Jauberteau, J.L. Jauberteau, P. Goudeau, B. Soulestin, M. Marteau, M. Cahoreau, J. Aubreton
    Investigations on a nitriding process of molybdenum thin films exposed to (Ar-N2-H2) expanding microwave plasma
    Surf. Coat. Technol., 203 (2009), 1127-1132

  2. I. Jauberteau, M. Nadal, J.L. Jauberteau
    Atomic Force Microscopy investigations on nanoindentation impressions of some metals : effect of piling-up on hardness measurements
    J. Mater. Sci., 43 (2008), 5956-5961

  3. I. Jauberteau, J.L. Jauberteau, M. Cahoreau, J. Aubreton
    Surface reactivity of molybdenum thin films exposed to (Ar-N2-H2) expanding microwave at low temperature : influence of the addition of H2 gas in the plasma
    J. Phys. D : Appl. Phys., 38 (2005), 3654-3663

Updated April 2, 2010

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